Abstract
Atomic Force Microscopy (AFM) has emerged as a powerful tool for nanoscale imaging and quantitative characterization of organic (e.g., live cells, proteins, DNA, lipid bilayers) and inorganic (e.g., silicon wafers, polymers) specimens. However, image artifacts in AFM height and peak force error images directly affect the precision of nanomechanical measurements. Experimentalists face considerable challenges in obtaining high-quality AFM images due to the requirement of specialized expertise and constant manual monitoring.
Another challenge is the lack of high-quality AFM datasets to train machine learning models for automated defect detection. In this work, we propose a two-step AI framework that combines a vision-based deep learning (DL) model for classifying AFM image defects with a Large Language Models (LLMs)-based conversational assistant that provides real-time corrective guidance in natural language, making it particularly valuable for non-AFM experts aiming to obtain high-quality images.
We curated an annotated AFM defect dataset spanning organic and inorganic samples to train the defect detection model. Our defect classification model achieves 91.43% overall accuracy, with a recall of 93% for tip contamination and 60% for not-tracking defects.
Two-Step AI Framework
Vision Model
Deep learning model classifies defects in AFM images with 91.43% accuracy
LLM Assistant
Conversational AI provides real-time guidance in natural language
Unified Interface
Seamless interaction between DL model and LLM-based guidance
Model Performance
Overall Accuracy
Tip Contamination Recall
Not-Tracking Recall